Application

4-Point measurement of wafer resistivity 4-Point measurement of epitaxial and diffused layer resistivity (where the layer is of the opposite conductivity type to the substrate, or the substrate is an insulator) 3-Point Spreading resistance measurements


Features

- Highly repeatable needle contact conditions owing to controlled velocity of descent
- Individually adjustable needle loadings with direct indication of set load
- Kinematic needle guidance system employing precision ruby ball guides and polished tungsten carbide rods
- Solid tungsten carbide needles with precision radiused tips
- Accuracy of needle spacing +/- 0.01mm, no side play
- Needles may be readily replaced without fear of derangement or loss of accuracy
- Fully visible contact areaMicrometer controlled slice displacement for determination of resistivity gradient or junctions on a bevelled slice.
- Hinged steel cover to eliminate effects of light and electrical interference during measurement